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Journal Articles
Publisher: ASME
Article Type: Research Papers
J. Manuf. Sci. Eng. June 2010, 132(3): 031003.
Published Online: April 29, 2010
...King Wai Chiu Lai; Jeffri J. Narendra; Ning Xi; Jiangbo Zhang; Timothy A. Grotjohn; Jes Asmussen Plasma processing is an important technology, which provides a capability to modify the material surface through etching, deposition, activation, functionalization, polymerization, etc. In the current...
Journal Articles
Publisher: ASME
Article Type: Research Papers
J. Manuf. Sci. Eng. February 2010, 132(1): 011005.
Published Online: January 6, 2010
...Jack Zhou; Guoliang Yang There are three major steps toward the fabrication of a single-digit nanohole: (1) preparing the free-standing thin film by epitaxial deposition and electrochemical etching, (2) making submicron holes ( 0.2 – 0.02 μ m ) by focused ion beam (FIB), and (3) reducing the hole...
Journal Articles
Journal Articles
Journal Articles
Publisher: ASME
Article Type: Technical Papers
J. Manuf. Sci. Eng. May 2003, 125(2): 310–315.
Published Online: April 15, 2003
... of thin surface layers affected by manufacturing processes. The so-called white etching layer (WL) produced in steel surfaces by machining and abrasion is characterized. The WL is found to have a hardness in the range of 11.5–16.2 GPa, which is significantly greater than that of untempered martensite...
Journal Articles
Publisher: ASME
Article Type: Technical Papers
J. Manuf. Sci. Eng. November 2000, 122(4): 760–765.
Published Online: October 1, 1998
...Herman C. J. Bruneel The paper studies the intrinsic errors on strain measurements induced by the application of an electrochemical etched square grid through serigraphy. Systematic periodic strains are observed when the etched grid is directly measured before any mechanical deformation...