For the preparation of high-quality films of high-Tc superconductors (HTSC) on crystalline substrates, it is necessary to control the substrate temperature accurately during deposition. This study shows that thermal radiation heat transfer in the deposition chamber governs the substrate temperature. The application of thin-film optics yields the emittance of the substrate holder-substrate-film composite as a function of the thickness of the growing film. In a single-target off-axis sputtering system, the substrate temperature is measured during film deposition using a novel method for the attachment of a thermocouple to the substrate front surface. For constant heater power, the measurements show a decrease of the substrate temperature, in agreement with the theoretical prediction. Based on the substrate emittance variation determined in this work, a pyrometric in-situ temperature measurement technique can be developed.
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Thermal Analysis and Control for Sputtering Deposition of High-Tc Superconducting Films
M. I. Flik,
M. I. Flik
Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
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B. I. Choi,
B. I. Choi
Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
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A. C. Anderson,
A. C. Anderson
Lincoln Laboratory, Massachusetts Institute of Technology, Cambridge, MA 02139
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A. C. Westerheim
A. C. Westerheim
Lincoln Laboratory and Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
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M. I. Flik
Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
B. I. Choi
Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
A. C. Anderson
Lincoln Laboratory, Massachusetts Institute of Technology, Cambridge, MA 02139
A. C. Westerheim
Lincoln Laboratory and Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
J. Heat Transfer. Feb 1992, 114(1): 255-263 (9 pages)
Published Online: February 1, 1992
Article history
Received:
September 24, 1990
Revised:
July 1, 1991
Online:
May 23, 2008
Citation
Flik, M. I., Choi, B. I., Anderson, A. C., and Westerheim, A. C. (February 1, 1992). "Thermal Analysis and Control for Sputtering Deposition of High-Tc Superconducting Films." ASME. J. Heat Transfer. February 1992; 114(1): 255–263. https://doi.org/10.1115/1.2911255
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