In this paper the basic residual stress problem for multilayered or multiple films on an elastic substrate is considered. The stresses may be caused by a homogeneous temperature variation or slow thermal cycling and by far field mechanical loading. The films are approximated by orthotropic membranes and the substrate is assumed to be an elastic continuum. The interfacial zone is modeled by either an ideal interface or a homogeneous shear layer. The primary interest in the paper is in examining stress concentrations or singularities near the film ends. For the two interface conditions considered, this is done by varying the film/substrate contact angle. Also studied are strain energy release rate for the propagation of an interfacial crack and the direction and the magnitude of the maximum cleavage stress for a possible crack initiation in the substrate. The basic modeling and analysis are considered in Part I. Part II of the paper is devoted to the presentation and discussion of the results.
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December 1990
Research Papers
Mechanical Modeling of Multilayered Films on an Elastic Substrate—Part I: Analysis
F. Erdogan,
F. Erdogan
Lehigh University, Bethlehem, PA 18015
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P. F. Joseph
P. F. Joseph
Lehigh University, Bethlehem, PA 18015
Search for other works by this author on:
F. Erdogan
Lehigh University, Bethlehem, PA 18015
P. F. Joseph
Lehigh University, Bethlehem, PA 18015
J. Electron. Packag. Dec 1990, 112(4): 309-316 (8 pages)
Published Online: December 1, 1990
Article history
Received:
August 30, 1989
Revised:
August 2, 1990
Online:
April 28, 2008
Citation
Erdogan, F., and Joseph, P. F. (December 1, 1990). "Mechanical Modeling of Multilayered Films on an Elastic Substrate—Part I: Analysis." ASME. J. Electron. Packag. December 1990; 112(4): 309–316. https://doi.org/10.1115/1.2904383
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