Electron Exposure Measurements of Candidate Solar Sail Materials

[+] Author and Article Information
Tesia L. Albarado, William A. Hollerman

Department of Physics, University of Louisiana at Lafayette, P.O. Box 44210, Lafayette, Louisiana 70504

David Edwards, Whitney Hubbs

Marshall Space Flight Center, National Aeronautics and Space Administration, Mail Stop ED31, MSFC, Alabama 35812

Charles Semmel

Qualis Corporation, 6767 Old Madison Pike, Huntsville, Alabama 35806

J. Sol. Energy Eng 127(1), 125-130 (Feb 07, 2005) (6 pages) doi:10.1115/1.1823495 History: Received June 16, 2003; Revised June 14, 2004; Online February 07, 2005
Copyright © 2005 by ASME
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Grahic Jump Location
Low energy electron (LEE) system
Grahic Jump Location
Surface reflectivity as a function of wavelength for aluminized (a) Mylar and (b) Kapton
Grahic Jump Location
Data acquisition diagram
Grahic Jump Location
Kapton stress versus time data with 706 Mrad total electron exposure
Grahic Jump Location
Kapton stress versus time data with no electron exposure
Grahic Jump Location
Mylar stress versus time plot (electron fluence for 8000 min is equal to a dose of 608 Mrad)




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